C2V

ODIN: Advanced mask editor for MEMS

Design and mask layout platform

C2V announces Odin, its Mask Editor for Micro Systems. Odin is a fully parametric mask editor dedicated to the MEMS design process. A library of elements is included and provides many standard elements like straight and curved comb drives, several springs, microTAS elements etc. Furthermore, the import and export of masks in different formats is possible.

C2V is dedicated to software development and design of planar integrated optics components, and to the design and production of MEMS for process control, microfluidic, telecom and datacom applications. This powerful combination resulted in Odin, the Mask Editor for Micro Systems.

• Highly reliable
• Remarkable reduction in design time
• Open interface
• Excellent support

OlympIOs: Design, simulation and mask layout platform

C2V is the leading supplier of high performance tools for simulation and design in integrated optics components. The modular software platform OlympIOs is continually improved and updated through ongoing investment and collaboration with internal and external customers worldwide. Our world renowned products Prometheus, TempSelene and StressSelene are still available, as typical combinations of OlympIOs modules.

Advantages of OlympIOs:·

• The most powerful design tool available
• Unmatched flexibility
• Reduces design cycle time
• Cost effective (modular approach)
• Open interface
• Excellent support

OlympIOS modules

The following modules are available:

• Optical mode solvers
• Beam Propagation Method (BPM)
• Bi-directional Eigenmode Propagation (BEP)
• Electro Optic simulation
• Thermo optic simulation
• Stress-induced birefringence modeling
• Yield simulation and optimization
• Mask layout
• Script for batch processing
• Distributed Computing

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